Munguva pfupi yapfuura, vashandisi vazhinji vakabvunza nezve zvakanakira uye zvakaipira zve sputtering coating tekinoroji, Zvinoenderana nezvinodiwa nevatengi vedu, ikozvino nyanzvi dzeRSM Technology Dhipatimendi dzichagovana nesu, tichitarisira kugadzirisa matambudziko.Panogona kunge paine mapoinzi anotevera:
1, Kusagadzikana magnetron sputtering
Tichifunga kuti iyo magineti inoyerera ichipfuura nemukati uye kunze magineti pole kumigumo yemagnetron sputtering cathode haina kuenzana, iyo isina kuenzana magnetron sputtering cathode.Iyo magnetic field yeyakajairwa magnetron sputtering cathode yakamisikidzwa pedyo nenzvimbo yainotarirwa, ukuwo magineti eiyo unbalanced magnetron sputtering cathode inopenya kunze kwechinangwa.Iyo magineti yemagineti yeakajairwa magineti cathode inoganhurira zvakasimba plasma padyo nenzvimbo yainotarirwa, nepo plasma iri pedyo nesubstrate haina kusimba, uye substrate haizobhombwa nemaoni akasimba nemaerekitironi.Iyo isiri-equilibrium magnetron cathode magineti inogona kuwedzera plasma kure kure nenzvimbo yakatariswa uye kunyudza iyo substrate.
2, Radio frequency (RF) sputtering
Nheyo yekuisa insulating firimu: mukana wakashata unoshandiswa kune conductor akaiswa kumashure kwechinangwa chekudzivirira.Mune inopenya inoburitsa plasma, kana iyo yakanaka ion inotungamira ndiro inomhanyisa, inobhomba iyo insulating chinangwa pamberi payo kuti iparadze.Iyi sputtering inogona kungogara kwe10-7 seconds.Mushure maizvozvi, simba rakanaka rinoumbwa nechaji yakanaka yakaunganidzwa pachinangwa chekudzivirira chinobvisa kukanganisa kwakashata pane kondakita ndiro, saka bombardment ye-high-energy positive ions pane insulating target inomiswa.Panguva ino, kana polarity yemagetsi ikadzoserwa kumashure, maerekitironi anozobhomba ndiro inodzivirira uye kudzora chaji yakanaka pane insulating plate mukati memasekonzi 10-9, ichiita zero yayo.Panguva ino, kudzoreredza polarity yemagetsi anogona kuburitsa sputtering kwemasekonzi 10-7.
Zvakanakira zveRF sputtering: zvese simbi zvibodzwa uye dielectric zvinonangwa zvinogona kupushwa.
3, DC magnetron sputtering
Iyo magnetron sputtering coating equipment inowedzera simba remagineti muDC sputtering cathode target, inoshandisa simba reLorentz remagnetic field kusunga nekuwedzera trajectory yemaerekitironi mumunda wemagetsi, inowedzera mukana wekudhumhana pakati pemaerekitironi nemaatomu egasi, inowedzera ionization rate yemaatomu egasi, inowedzera huwandu hweayoni ane simba guru achibhomba chinangwa uye inoderedza huwandu hwemaerekitironi ane simba guru anobhomba pasi rakaputwa.
Zvakanakira zve planar magnetron sputtering:
1. Iyo inonangwa simba density inogona kusvika 12w / cm2;
2. The target voltage inogona kusvika 600V;
3. Mhepo yegesi inogona kusvika 0.5pa.
Kuipa kwe planar magnetron sputtering: chinonangwa chinoumba chiteshi chekupopotera munzvimbo yerunway, kudonhedza kwese kwakanangana nepamusoro hakuna kuenzana, uye chiyero chekushandisa chechinangwa chinongova 20% - 30%.
4, Yepakati frequency AC magnetron sputtering
Zvinoreva kuti mune yepakati frequency AC magnetron sputtering zvishandiso, kazhinji zvibodzwa zviviri zvine saizi yakafanana uye chimiro zvinogadziriswa padivi nepadivi, zvinowanzonzi mapatya zvinangwa.Iwo suspended installations.Kazhinji, zvinangwa zviviri zvinoiswa simba panguva imwe chete.Mukuita kwepakati frequency AC magnetron reactive sputtering, izvo zvinangwa zviviri zvinoshanda seanode uye cathode mukuchinjana, uye vanoita seanode cathode imwe neimwe muhafu imwechete kutenderera.Kana chinangwa chiri pane yakashata hafu yekutenderera inokwanisa, iyo inotarirwa pamusoro inoputirwa uye inopushwa nemaoni akanaka;Muchikamu chakanaka chepakati, maerekitironi eplasma anokwidziridzwa kuenda kunzvimbo yakanangwa kuti aite kuti mutero wakanaka wakaunganidzirwa pamusoro penzvimbo inodzivirira yenzvimbo inotarirwa, iyo isingangotsikidzi kupisa kwenzvimbo yakatariswa, asi zvakare inobvisa chiitiko che " anode kunyangarika. "
Zvakanakira zvepakati frequency double target reactive sputtering ndezvi:
(1) High deposition rate.Kune zvibodzwa zvesilicon, iyo deposition rate yepakati frequency reactive sputtering iri kagumi iyo yeDC reactive sputtering;
(2) Iyo sputtering process inogona kudzikamiswa panzvimbo yakatarwa yekushanda;
(3) Chiitiko che "moto" chinobviswa.Kuremara density yeyakagadzirirwa insulating firimu mirairo yakati wandei yehukuru yakaderera pane iyo yeDC reactive sputtering nzira;
(4) Yepamusoro substrate tembiricha inobatsira kuvandudza kunaka uye kunamatira kwefirimu;
(5) Kana magetsi emagetsi ari nyore kuenderana nechinangwa pane RF magetsi.
5, Reactive magnetron sputtering
Mukuita sputtering, gasi rekuita rinodyiswa kuti riite pamwe chete nezvikamu zvakasvibiswa kuti zvibudise mafirimu akabatanidzwa.Inogona kupa reactive gasi kuita pamwe chete sputtering compound target panguva imwe chete, uye inogonawo kupa reactive gasi kuti iite ne sputtering simbi kana alloy target panguva imwe chete kugadzirira makomboni mafirimu ane akapihwa kemikari reshiyo.
Zvakanakira zve reactive magnetron sputtering komputa mafirimu:
(1) Zvinhu zvinotarisirwa uye magasi ekuita anoshandiswa okisijeni, nitrogen, hydrocarbons, nezvimwewo, izvo zvinowanzova nyore kuwana zvigadzirwa zvehutsanana, izvo zvinokonzeresa kugadzirira kwepamusoro-kuchena kombindi mafirimu;
(2) Nekugadzirisa maitiro ekugadzirisa, makemikari kana asiri emakemikari akabatanidzwa mafirimu anogona kugadzirwa, kuitira kuti maitiro emafirimu anogona kugadziriswa;
(3) Iyo substrate tembiricha haina kukwirira, uye pane zvishoma zvinorambidzwa pane substrate;
(4) Yakakodzera nzvimbo hombe yunifomu coating uye inoziva kugadzirwa kwemaindasitiri.
Mukuita reactive magnetron sputtering, kusagadzikana kwecompound sputtering kuri nyore kuitika, kunyanya kusanganisira:
(1) Zvakaoma kugadzirira zvinangwa zvakabatana;
(2) Chiitiko chearc striking (arc discharge) inokonzerwa nechinangwa chepfu uye kusagadzikana kwekuita sputtering;
(3) Low sputtering deposition rate;
(4) Kuremara density yefirimu yakakwirira.
Nguva yekutumira: Jul-21-2022