Nekuwedzera kwekudiwa kwemusika, marudzi akawanda ekutsvaga sputtering anogara achigadziridzwa.Zvimwe zvinozivikanwa uye zvimwe hazvina kujairika kune vatengi.Zvino, tinoda kugoverana newe kuti ndedzipi mhando dzemagineti sputtering targets.
Sputtering target ine mhando dzinotevera: metal sputtering coating target, alloy sputtering coating target, ceramic sputtering coating target, boride ceramic sputtering target, carbide ceramic sputtering target, fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, selenide ceramics target. , silicide ceramic sputtering target, sulfide ceramic sputtering target, telluride ceramic sputtering target, zvimwe zvinangwa zveceramic, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs )
Magnetron sputtering inowanzokamurwa kuita marudzi maviri: DC sputtering uye RF sputtering.Iyo musimboti weDC sputtering equipment iri nyore, uye chiyero chayo chinomhanya zvakare kana uchipwanya simbi.RF sputtering inoshandiswa zvakanyanya.Kuwedzera kune sputtering conductive data, inogona zvakare sputter isiri-conductive data.Panguva imwecheteyo, iyo sputtering target inobatawo reactive sputtering kugadzirira komputa data senge oxides, nitrides uye carbides.Kana iyo RF frequency ikawedzera, inova microwave plasma sputtering.Parizvino, electron cyclotron resonance (ECR) microwave plasma sputtering inowanzoshandiswa.
Nguva yekutumira: May-18-2022