Iyo firimu yakaonda pane yakavharwa chinangwa chimiro chakakosha chenyama.Munzvimbo chaiyo yehukobvu, chiyero chidiki kwazvo, inova microscopic inoyerwa huwandu.Uye zvakare, nekuda kwekutaridzika uye kutaridzika kwehupamhi hwefirimu, kuenderera kwezvinhu kunopera, izvo zvinoita kuti data remufirimu uye data inotarirwa zvive zvakasiyana zvakajairika. Uye chinangwa chiri kunyanya kushandiswa kwemagnetron sputtering coating, Beijing Richmat's edither ichatitora kuti tinzwisise. musimboti uye unyanzvi sputtering coating.
一、Nheyo yekuputira machira
Sputtering coating hunyanzvi ndeye kushandisa ion shelling chitarisiko chitarisiko, maatomu anonangwa anorohwa kunze kwechiitiko chinonzi sputtering.Maatomu akaiswa pamusoro peiyo substrate anonzi sputtering coating. Kazhinji, gasi ionization inogadzirwa nekubuda kwegasi, uye iyo ion yakanaka inobhomba cathode chinangwa nekumhanya kwakanyanya pasi pechiito chemunda wemagetsi, ichirova kunze maatomu kana mamorekuru. cathode target, uye ichibhururuka kusvika pamusoro pe substrate kuti iiswe mufirimu.Kungotaura chete, sputtering coating inoshandisa low pressure inert gas glow discharge kuti ibudise ions.
Kazhinji, iyo sputtering firimu yeplating michina inoshongedzerwa nemagetsi maviri muvacuum discharge chamber, uye cathode target inoumbwa nedata rekuputira.Iyo vacuum kamuri yakazadzwa ne argon gasi nekumanikidza kwe 0.1 ~ 10Pa.Glow discharge inoitika pacathode pasi pekuita kwe negative high voltage ye 1 ~ 3kV dc kana rf voltage ye 13.56mhz. Argon ions inobhomba nzvimbo yakanangwa uye inoita kuti maatomu akapushwa aungane pasubstrate.
二、Sputtering coating hunyanzvi maitiro
1, Fast stacking kumhanya
Musiyano uripo pakati pehigh speed magnetron sputtering electrode uye zvechinyakare stage two spttering electrode ndewekuti magineti yakarongwa pazasi pechinangwa, saka rakavharika remagineti remagineti rinoitika pamusoro pechinangwa. Simba re lorentz pama electron rakananga pakati yeheterogeneous magnetic field.Nekuda kwekuita kwekutarisa, maerekitironi anotiza zvishoma.Iyo heterogeneous magineti inofamba ichitenderedza nzvimbo yakatariswa, uye echipiri maerekitironi akabatwa mune heterogeneous magineti anodhumhana nemamolekemu egasi kakawanda, izvo zvinovandudza kutendeuka kwakanyanya kwemamorekuru egasi. Naizvozvo, iyo yekumhanyisa magnetron sputtering inoshandisa simba rakaderera, asi inogona kuwana yakakura coating kunyatsoshanda, ine yakanaka yekuburitsa maitiro.
2, Iyo substrate tembiricha yakaderera
High speed magnetron sputtering, inozivikanwawo seyakadzika tembiricha sputtering.Chikonzero ndechekuti mudziyo unoshandisa zvinobuda munzvimbo yemagetsi emagetsi akananga kune mumwe nemumwe.Maerekitironi echipiri anoitika kunze kwechinangwa, mune rimwe nerimwe.Pasi pechiito chemunda wakatwasuka wemagetsi, inosungwa pedyo nenzvimbo yechinangwa uye inofamba ichitevedza mugwagwa wedenderedzwa, ichiramba ichigogodza pamamorekuru egasi kuti ionise mamorekuru egasi. Pamwe chete, maerekitironi pachawo zvishoma nezvishoma anorasikirwa nesimba rawo, kuburikidza anodzokororwa mapundu, kusvikira simba ravo rave kupera zvachose vasati vakwanisa kutiza kubva pamusoro pechinangwa pedyo ne substrate.Nekuda kwekuti simba remaerekitironi rakaderera, tembiricha yechinhu chiri kutariswa haikwire zvakanyanya.Izvo zvakakwana kurwisa kukwira kwekushisa kwe substrate kunokonzerwa ne-high-energy electron bombardment yeyakajairika diode shot, iyo inopedzisa cryogenization.
3. Yakasiyana-siyana ye membrane zvimiro
Mamiriro emafirimu akatetepa anowanikwa nevacuum evaporation uye jekiseni deposition yakasiyana chaizvo neiyo inowanikwa nekuonda kwakawanda kwakasimba.Mukupesana neyakaomeswa yagara iripo, iyo yakarongedzerwa seyakafanana chimiro mumativi matatu, mafirimu akaiswa muchikamu chegasi anoiswa mumhando dzakasiyana-siyana.Mafirimu matete ane columnar uye anogona kuongororwa ne scanning electron microscopy.Iko kukura kweiyo firimu kunokonzerwa neiyo yekutanga convex pamusoro peiyo substrate uye mashoma mimvuri munzvimbo dzakakurumbira dze substrate.Nekudaro, chimiro uye saizi yekoramu zvakasiyana zvakanyanya nekuda kweiyo substrate tembiricha, kupararira kwepamusoro kwemaatomu akaturikidzana, kuvigwa kwemaatomu ekusachena uye chiitiko Angle yemaatomu echiitiko ane chekuita neiyo substrate pamusoro.Pakunyanya kupisa kwekushisa, iyo firimu yakaonda ine fibrous structure, high density, inoumbwa nefine columnar crystals, iyo ndiyo yakasarudzika chimiro che sputtering firimu.
Sputtering pressure uye firimu stacking speed inokanganisawo chimiro chefirimu.Nekuti mamorekuru egasi ane mhedzisiro yekudzvanyirira kupararira kwemaatomu pamusoro peiyo substrate, mhedzisiro yeakakwira sputtering pressure inokodzera iyo substrate tembiricha inodonha mumuenzaniso.Naizvozvo, mafirimu ane porous ane zviyo zvakanaka anogona kuwanikwa pakakwirira sputtering pressure.Iyi firimu diki saizi yezviyo inokodzera kuzora, kupfeka kuramba, kuomeswa kwepamusoro uye mamwe ma mechanical application.
4, Ronga kuumbwa zvakaenzana
Macompounds, misanganiswa, alloys, nezvimwewo, izvo zvakaoma zvakafanira kuvharwa nevacuum evaporation nekuti matsimba emhute ezvikamu anosiyana kana nekuti anosiyanisa kana achipisa.Sputtering coating method ndeyekugadzira chinongedzo chepamusoro pemaatomu akaturikidzana ne layer. kune substrate, mupfungwa iyi inyanzvi yekugadzira mafirimu.Ese marudzi ezvishandiso anogona kushandiswa muindasitiri yekubatisa kugadzirwa nekuputika.
Nguva yekutumira: Kubvumbi-29-2022