Magnetron sputtering coating inzira nyowani yekuputira mhute, kana ichienzaniswa neyekutanga evaporation coating nzira, mabhenefiti ayo mune akawanda maficha anoshamisa.Se tekinoroji yakakura, magnetron sputtering yakashandiswa muminda yakawanda.
Magnetron sputtering musimboti:
An orthogonal magnetic field uye yemagetsi munda inowedzerwa pakati pe sputtered target pole (cathode) uye anode, uye inodiwa inert gasi (kazhinji Ar gas) inozadzwa mukamuri yepamusoro yevacuum.Iyo magineti yechigarire inoumba 250-350 gaus magineti pamusoro pechinhu chakanangwa, uye iyo orthogonal electromagnetic munda inoumbwa neiyo yakakwira voltage munda wemagetsi.Pasi pemhedzisiro yendima yemagetsi, Ar gasi ionization kuita maion akanaka uye maerekitironi, inonangwa uye ine kumwe kudzvanywa kwakashata, kubva pachinangwa kubva padanda nemhedzisiro yemagineti uye gasi rinoshanda ionization mukana wekuwedzera, inoumba yakakwira density plasma padyo ne cathode, Ar ion pasi pechiito che lorentz force, mhanyisa kubhururuka uchienda kwainovavarira, kubhomba nzvimbo yakanangwa nekumhanya kukuru, Maatomu akapushwa ari pachinangwa anotevera musimboti wekushandura simba uye kubhururuka kubva panzvimbo yakanangwa nepamusoro kinetic. simba kune substrate deposition film.
Magnetron sputtering inowanzokamurwa kuita marudzi maviri: DC sputtering uye RF sputtering.Iyo musimboti weDC sputtering equipment iri nyore, uye chiyero chinokurumidza kana uchipfira simbi.Iko kushandiswa kweRF sputtering kwakawedzera, mukuwedzera kune sputtering conductive zvinhu, asiwo sputtering non-conductive zvinhu, asiwo reactive sputtering gadziriro yemaokisi, nitrides uye carbides nezvimwe zvinhu zvakasanganiswa.Kana iyo frequency yeRF ichiwedzera, inova microwave plasma sputtering.Parizvino, electron cyclotron resonance (ECR) mhando microwave plasma sputtering inowanzoshandiswa.
Magnetron sputtering coating target material:
Metal sputtering target material, coating alloy sputtering coating material, ceramic sputtering coating material, boride ceramic sputtering target materials, carbide ceramic sputtering target material, fluoride ceramic sputtering target material, nitride ceramic sputtering target materials, oxide ceramic target, selenide ceramic sputtering. silicide ceramic sputtering target materials, sulfide ceramic sputtering target material, Telluride ceramic sputtering target, imwe ceramic target, chromium-doped silicon oxide ceramic target (CR-SiO), indium phosphide target (InP), lead arsenide target (PbAs), indium arsenide. chinangwa (InAs).
Nguva yekutumira: Aug-03-2022