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CuMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Molybdenum

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

CuMo

Composition

Copper Molybdenum

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

PM

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Copper Molybdenum sputtering target inogadzirwa nenzira ye infiltration sintering: Molybdenum powders sintered uye inoumbwa kuita semi-finished products, yakasanganiswa neinozotevera microwave-assisted aqueous solution strategy.Copper Molybdenum alloy ine yakatanhamara yemuviri uye michina zvivakwa: inogutsa magetsi uye yekupisa conductivity, yakaderera uye inogadziriswa coefficient yekuwedzera kwekupisa, kupfeka kuramba, uye yakakwirira tembiricha simba.

Zvinyorwa (%)

Cu

Mo

Kusachena (%)

MoCu10

10±2

Balance

≤0.1

MoCu15

15±3

Balance

≤0.1

MoCu20

20±3

Balance

≤0.1

MoCu25

25±3

Balance

≤0.1

MoCu40

40±5

Balance

≤0.1

Rich Special Equipment inyanzvi muKugadzira Sputtering Target uye inogona kugadzira Copper Molybdenum Sputtering Materials zvinoenderana neVatengi 'mataurirwo.Kuti uwane mamwe mashoko, tapota taura nesu.


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