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CuAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Aluminium

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

CuAl

Composition

Copper Aluminium

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Copper Aluminium sputtering target yakakwana kune akati wandei maindasitiri uye maapplication, nekuda kwekuoma kwayo kwakanyanya, kusimba kwesimba uye kureruka huremu.Iyo kazhinji ine 1-3% yemhangura yemukati uye ine yakafanana makemikari zvimiro neAluminium.CuAl ine yakakwira mechanicha zvivakwa, yakanakisa machinability, uye yakakwirira-tembiricha kukodzera, saka inogona kunge iri yakakodzera zvinhu zvekushanda kweAluminium alloy.Kuchena kwepamusoro CuAl alloy sputtering target inogona kushandiswa munzvimbo dzakawanda dzemaindasitiri kubva kune semiconductor uye zvemagetsi zvinoshanda zvikamu.

Rich Special Equipment inyanzvi muKugadzira KweSputtering Target uye inogona kugadzira Copper Aluminium Sputtering Materials zvinoenderana neVatengi 'mataurirwo.Zvigadzirwa zvedu zvinoratidzira zvakanakisa zvemuchina zvivakwa, homogeneous chimiro, yakakwenenzverwa nzvimbo isina kupatsanurwa, pores kana makatsemuka.Kuti uwane mamwe mashoko, tapota taura nesu.


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