CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made
Chromium Aluminium
Kugadzirwa kweChromium Aluminium Sputtering Targets kunosanganisira matanho anotevera:
1. Kukuya uye kusanganisa.
2. Kupisa isostatic kudzvanya kurapa kuti uwane semi-apedza zvigadzirwa.
3. Kugadzira rough chromium aluminum alloy sputtering target material kuwana chromium aluminum alloy sputtering target material.
Munguva yekuisa maitiro eCrAl sputtering zvinangwa, yakaoma Aluminium-Chrom-Nitrid (AlCrN) coating inogadzirwa.Uku kupfekedza kunoratidza kuomarara kwakanyanya uye oxidation kuramba zvivakwa kunyangwe pakupisa kwakanyanya.Iwo anocheka anogona kumhanya nepamusoro pekudya kuti awedzere goho uye kusimudza mhando kana uchishandisa CNC michina.
Yedu yakajairika AlCr tarisiro uye zvivakwa zvavo
| Cr-70Alpa% | Cr-60Alpa% | Cr-50Alpa% | |
| Kuchena (%) | 99.8/99.9/99.95 | 99.8/99.9/99.95 | 99.8/99.9/99.95 |
| Density(g/cm3） | 3.7 | 4.35 | 4.55 |
| Gmvura Size(µm) | 100/50 | 100/50 | 100/50 |
| Process | HIP | HIP | HIP |
Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Aluminium Chromium Sputtering Materials zvinoenderana neVatengi'madidziro.Zvigadzirwa zvedu zvinoratidzira zvakanakisa zvemuchina zvivakwa, homogeneous chimiro, yakakwenenzverwa nzvimbo isina kupatsanurwa, pores kana makatsemuka.Kuti uwane mamwe mashoko, tapota taura nesu.
