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CrAlW Alloy Sputtering Target High Purity Thin Firimu Pvd Coating Tsika Yakagadzirwa

Chrome Aluminium Tungsten

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

CrAlW

Composition

Chrome Aluminium Tungsten

Kuchena

99.7%, 99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

PM

Saizi Inowanikwa

L≤2000mm,W≤200mm


Product Detail

Product Tags

Chrome Aluminium Tungsten sputtering target inogadzirwa nenzira yepoda metallurgy kuti iwane kuchena kwepamusoro, homogeneous microstructure, high density uye high magetsi conductivity.

Chrome Aluminium Tungsten alloy chinhu chakakwana cheInterconnects uye electrodes maindasitiri.Iyo ine yakatsetseka pamusoro, yakakwira deposition rate, kuoma, dielectric simba, uye inogona kunyatso kusanganiswa neiyo substrate zvinhu.

Rich Special Equipment inyanzvi muKugadzira Sputtering Target uye inogona kugadzira Chronium Aluminium Tungsten Sputtering Materials zvinoenderana neVatengi.Zvigadzirwa zvedu zvinoratidzira kuchena kwepamusoro, chimiro chehomogeneous, yakakwira density isina kupatsanurwa, pores kana kuputika.Kuti uwane mamwe mashoko, tapota taura nesu.


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