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FeAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Iron Aluminium Alloy Target

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

FeAl

Composition

Iron Aluminium alloy chinangwa

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤2000mm,W≤200mm


Product Detail

Product Tags

Kazhinji, Iron Aluminium alloy sputtering target ine 6% -16% zviri mukati meAluminium.Inoratidza yakanakisa magineti zvimiro uye inowanzoshandiswa mufirimu deposition ye micromotors.
Iron Aluminium alloys anowanzo kuwanikwa mumitsetse ine ukobvu hwe 0.1-0.5mm.Iwo anoratidza yakakwirira resistivity, kuoma, vibration uye kukanganisa kuramba, akasanganiswa neakaderera density (6.5 ~ 7.2g/m3).Iron cores yakagadzirwa kubva kuIron Aluminium mapepa ane yakaderera eddy ikozvino kurasikirwa uye huremu huremu.

Iron Aluminium Alloys akakamurwa kuita: 1J6.1J12.1J16, nhamba iri kumashure kweJ ndiyo yeAluminium.Nekuwedzera kweAluminium yemukati, iyo magineti conductivity uye resistivity yezvinhu zvaizovandudzwa, nepo saturation yemagineti induction - yakaderera.
Rich Special Equipment inyanzvi muKugadzira KweSputtering Target uye inogona kugadzira Iron Aluminium Sputtering Materials zvinoenderana neVatengi 'zvakatemwa.Kuti uwane mamwe mashoko, tapota taura nesu.


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