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NiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Aluminium

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

NiAl

Composition

Nickel Aluminium

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Nickel Aluminium alloy sputtering target inogadzirwa nenzira yekunyungudika kwevacuum uye simba resimbi.Kusanganisa Aluminium neNickel muhuwandu hunodiwa kupa NiAl casting ingot.Iyo ingot yekukanda inochekwa kuti iite inodiwa chimiro chechinangwa.Iyo ine yakakwirira kuenderana, yakanatswa zviyo saizi uye homogeneous microstructure, isina gasi puff kana pores.

Nekuda kwemusanganiswa wayo wakanaka wejasi uye substrate zvinhu, iyo NiAl coating ine kuita kwakanaka pasi pe700 ℃.Ikozvino iyo NiAl sputtering tarisiro inoshandiswa zvakanyanya mukupfeka isingachinjiki machira, anosanganisira ekucheka maturusi, mold, mota uye maindasitiri ekuvaka.

Rich Special Materials ndiye Mugadziri weSputtering Target uye anogona kugadzira Nickel Aluminium Sputtering Materials zvinoenderana neVatengi'madidziro.Kuti uwane mamwe mashoko, tapota taura nesu.


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