NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Tantalum Sputtering Targets inogadzirwa nenzira yekunyunguduka kwevacuum kana poda metallurgical process.Iine kuchena kwepamusoro uye homogeneous microstructure.

Nickel Tantalum Sputtering Targets anoshandiswa zvakanyanya mumhepo, ndege, maindasitiri ekufambisa.Kuramba kwayo kwakanaka kune yakanyanya tembiricha yepasi reactivity kunobva kune yakakura huwandu hweTantalum iripo mune alloy, ine yakanyanya kunyungudika tembiricha ye3000 ° C.Aluminium, Yttrium uye Chronium zvinowanzowedzerwa kuitira kuvandudza zvivakwa.

Rich Special Materials anoshanda muKugadzira kweSputtering Target uye anogona kugadzira Nickel Tantalum Sputtering Materials zvinoenderana neVatengi'madidziro.Kuti uwane mamwe mashoko, tapota taura nesu.