Tungsten Silicide
Tungsten Silicide
Tungsten silicide WSi2 inoshandiswa semagetsi ekuvhundutsa zvinhu mumicroelectronics, ichivharika pawaya dzepolysilicon, anti-oxidation coating uye kuramba waya yekupotera.Tungsten silicide inoshandiswa sechinhu chekubata mu microelectronics, ine resistivity ye60-80μΩcm.Inogadzirwa pa1000 ° C.Inowanzo shandiswa se shunt ye polysilicon mitsetse kuti iwedzere conductivity yayo uye kuwedzera chiratidzo chekukurumidza.Iyo tungsten Silicide layer inogona kugadzirwa nemakemikari vapor deposition, senge vapor deposition.Shandisa monosilane kana dichlorosilane uye tungsten hexafluoride seyakagadzirwa gasi.Iyo firimu yakaiswa haisi-stoichiometric uye inoda annealing kuti ishandurwe kuva imwe inofambisa stoichiometric fomu.
Tungsten silicide inogona kutsiva yekutanga tungsten firimu.Tungsten silicide inoshandiswawo sechivhariso musara pakati pesilicon nedzimwe simbi.
Tungsten silicide yakakoshawo mu microelectromechanical systems, pakati payo tungsten silicide inonyanya kushandiswa sefirimu yakaonda yekugadzira microcircuits.Nechinangwa ichi, iyo tungsten silicide firimu inogona kuve plasma-yakaiswa uchishandisa, semuenzaniso, silicide.
| ITEM | Kemikari yakagadzirwa | |||||
| Element | W | C | P | Fe | S | Si |
| Zvemukati(wt%) | 76.22 | 0.01 | 0.001 | 0.12 | 0.004 | Balance |
Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Tungsten Silicide Sputtering Zvishandiso zvinoenderana neVatengi 'mataurirwo.Kuti uwane mamwe mashoko, tapota taura nesu.
