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WNiFe Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Tungsten Nickel Iron

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

WNiFe

Composition

Tungsten Nickel Iron

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

PM

Saizi Inowanikwa

L≤200mm, W≤200mm


Product Detail

Product Tags

Tungsten Nickel Iron alloy sputtering target inogadzirwa nenzira yehupfu simbi.Iyo ine zvakawanda zvakasiyana zvivakwa, senge yakakwira density, ductility, uye simba risingaenzaniswi nechero imwe simbi alloy.Sezvineiwo chiyero cheNickel Iron chingave 7:3 kana 1:1.

Tungsten Nickel Iron alloy inoratidzira yakakwira density, simba, plasticity, machinability, yakanakisa yekupisa uye magetsi conductivity, uye kugona kutora x-ray uye γ mwaranzi.Tungsten Nickel Iron alloy inoshandiswa zvakanyanya mukudzivirira, counterweight, balancing, vibration dampening, tembiricha yekushandisa application.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Tungsten Nickel Iron Sputtering Zvishandiso zvinoenderana neVatengi'madidziro.Kuti uwane mamwe mashoko, tapota taura nesu.

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