AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made
Aluminium-Tantalum
Zvinangwa zvinogadzirwa nekusanganisa Aluminium neTantalum poda kana vacuum kunyungudika kunoteverwa nekukochekera kusvika kuzere density.Izvo zvakabatanidzwa zvinhu zvinosarudzwa kunyungudutswa uye zvino zvinogadzirwa kuita inodiwa chimiro chechinangwa.
Aluminium Tantalum sputtering target ine yakanyanya kuchena, homogeneous microstructure uye yakanakisa conductivity.Inoshandiswa zvakanyanya mukugadzira mafirimu matete eiyo flat panel kuratidza indasitiri.Aluminium Tantalum inogonawo kuwedzerwa kuti ibudise kushanda kwepamusoro Titanium alloy kuvandudza kunaka kwayo kwepamusoro-tembiricha.
Kusachena kwemukati kweAl-Ta alloy
| composition | Content(%） | ||||
| Ta | Fe | Si | C | O | |
| AlTa60 | 55.0~65.0 | ≤0.05 | ≤0.02 | ≤0.01 | ≤0.05 |
| AlTa70 | 65.0~75.0 | ≤0.05 | ≤0.02 | ≤0.01 | ≤0.05 |
Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Aluminium Tantalum Sputtering Materials zvinoenderana neVatengi 'mataurirwo.Zvigadzirwa zvedu zvinoratidzira zvakanakisa zvemuchina zvivakwa, homogeneous chimiro, yakakwenenzverwa nzvimbo isina kupatsanurwa, pores kana makatsemuka.Kuti uwane mamwe mashoko, tapota taura nesu.
