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ZrAl Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Zirconium Aluminium

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

ZrAl

Composition

Zirconium Aluminium

Kuchena

99.5%, 99.7%, 99.9%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting, PM

Saizi Inowanikwa

L≤200mm, W≤200mm


Product Detail

Product Tags

Zirconium Aluminium sputtering target inogadzirwa nenzira yevacuum kunyunguduka uye poda metallurgy.Zr-Al alloys seyemberi simbi matrix composite zvinhu inokwezva kune akasiyana akakosha maapplication.Zirconium inotsanangurwa diki yekuwedzera kune aruminiyamu alloys.

Kuvapo kwe zirconium mune aruminiyamu alloys kunogona kuderedza kukonzeresa kusagadzikana ngura uye inhibit recrystallization uye kukura kwezviyo patembiricha yakakwirira.

Rich Special Equipment ndiye Mugadziri weSputtering Target uye anogona kugadzira Zirconium Aluminium Sputtering Materials zvinoenderana neVatengi 'mataurirwo.Kuti uwane mamwe mashoko, tapota taura nesu.


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